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Representative drawing
RF signal monitoring apparatus and system for monitoring arc events in plasma processes
플라즈마 공정 중 발생하는 아크 현상을 모니터링하기 위한 rf 신호 모니터링 장치 및 시스템
- Category
- Patent (Korea)
- Application No. · Date
- 10-2020-0171629 · 2020.12.09
- Registration No. · Date
- 10-2208819 · 2021.01.22
- IPC
- H01J-037/32
- Claims
- 10
- Status
- Registered
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