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RF signal monitoring device and system for monitoring arc phenomena in plasma processes

用于监测在等离子体工序中产生的电弧现象的rf信号监测装置及系统

RF signal monitoring device and system for monitoring arc phenomena in plasma processes Representative drawing
Representative drawing
Category
Patent (China)
Application No. · Date
2021-10739441 · 2021.06.30
Registration No. · Date
CN 113471050 · 2023.03.07
IPC
H01J-037/32
Claims
10
Status
Registered
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